The underpotential deposition and surface characterization of metal and chalcogenide atomic layers used in electrochemical atomic layer epitaxy (EC-ALE): cadmium, tellurium, and sulfur
Abstract (Summary)Directed by John L. Stickney. Includes articles submitted to Journal of electroanalytical chemistry, Surface science, and Langmuir. Includes bibliographical references.
School:The University of Georgia
School Location:USA - Georgia
Source Type:Master's Thesis
Date of Publication: