The underpotential deposition and surface characterization of metal and chalcogenide atomic layers used in electrochemical atomic layer epitaxy (EC-ALE): cadmium, tellurium, and sulfur
Abstract (Summary)
Directed by John L. Stickney. Includes articles submitted to Journal of electroanalytical chemistry, Surface science, and Langmuir. Includes bibliographical references.
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School:The University of Georgia
School Location:USA - Georgia
Source Type:Master's Thesis
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