Temperature dependent analytical modeling, simulation and characterizations of HEMTs in gallium nitride process
Abstract (Summary)
Research is being conducted for a high-performance building block for high
frequency and high temperature applications that combine lower costs with improved
performance and manufacturability. Researchers have focused their attention on new
semiconductor materials for use in device technology to address system improvements.
Of the contenders, silicon carbide (SiC), gallium nitride (GaN), and diamond are
emerging as the front-runners.
GaN-based electronic devices, AlGaN/GaN heterojunction field effect transistors
(HFETs), are the leading candidates for achieving ultra-high frequency and high-power
amplifiers. Recent advances in device and amplifier performance support this claim. GaN
is comparable to the other prominent material options for high-performance devices.
The dissertation presents the work on analytical modeling and simulation of GaN
high power HEMT and MOS gate HEMT, model verification with test data and device
characterization at elevated temperatures. The model takes into account the carrier
mobility, the doping densities, the saturation velocity, and the thickness of different
layers. Considering the GaN material processing limitations and feedback from the
simulation results, an application specific AlGaN/GaN RF power HEMT structure has
been proposed. The doping concentrations and the thickness of various layers are selected
to provide adequate channel charge density for the proposed devices. A good agreement
between the analytical model, and the experimental data is demonstrated.
The proposed temperature model can operate at higher voltages and shows stable
operation of the devices at higher temperatures. The investigated temperature range is
from 100
v
0K to 6000K. The temperature models include the effect of temperature variation
on the threshold voltage, carrier mobility, bandgap and saturation velocity. The calculated
values of the critical parameters suggest that the proposed device can operate in the GHz
range for temperature up to 6000K, which indicates that the device could survive in
extreme environments. The models developed in this research will not only help the wide
bandgap device researchers in the device behavioral study but will also provide valuable
information for circuit designers.
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Bibliographical Information:
Advisor:
School:The University of Tennessee at Chattanooga
School Location:USA - Tennessee
Source Type:Master's Thesis
Keywords:
ISBN:
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