Study of the device characterization in AlGaN/GaN nanowires at low temperature and high magnetic field

by Hsin Lin, Wei

Abstract (Summary)
We have fabricated the device of High Electron Mobility Transistor(HEMT) on Al0.18Ga0.82N/GaN heterostructures. The mobility of 2DEG of the AlGaN/GaN is 9328 cm2/Vs and carrier concentration is 7.917 1012 cm-2 obtained by conventional van der pauw Hall measurement at temperature of 77 K. We made the conducting channel of nanometer wires on the AlGaN/GaN heterostructures for researching low-dimensional transport of two-Dimensional Electron Gas by gate controlled. From the SdH measurement, we can clearly observe the SdH oscillations and obtain the SdH frequencies. For the sample of 0922GaN-200 nm and 0922GaN-100 nm at 0.39 K,two constituted peaks of Gauss¡¦s function were fitted by Non-linear Curve and Two SdH oscillations beat each other, probably due to spin-splitting. However, we can¡¦t discover any trend in the experiment of gate controlled. In the future, we will try to improve the quality and discover the suitable depth of SiO2.
Bibliographical Information:

Advisor:Ming-Kwei Lee; Ikai Lo; Jih-Chen Chiang

School:National Sun Yat-Sen University

School Location:China - Taiwan

Source Type:Master's Thesis

Keywords:sdh algan gan 2deg


Date of Publication:07/18/2008

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