Some chemical and electrochemical aspects of the chemical mechanical polishing of copper [electronic resource] /
Abstract (Summary)
The full text of the dissertation is available as a Adobe Acrobat .pdf file (212 p.) ; Adobe Acrobat Reader required to view the file.
Bibliographical Information:
Advisor:
School:Pennsylvania State University
School Location:USA - Pennsylvania
Source Type:Master's Thesis
Keywords:hydrogen peroxide bare metal hydroxylamine chemical mechanical polishing cmp bta benzotriazole copper
ISBN:
Date of Publication: