Some chemical and electrochemical aspects of the chemical mechanical polishing of copper [electronic resource] /

by Al-Hinai, Ashraf Talib

Abstract (Summary)
The full text of the dissertation is available as a Adobe Acrobat .pdf file (212 p.) ; Adobe Acrobat Reader required to view the file.
Bibliographical Information:


School:Pennsylvania State University

School Location:USA - Pennsylvania

Source Type:Master's Thesis

Keywords:hydrogen peroxide bare metal hydroxylamine chemical mechanical polishing cmp bta benzotriazole copper


Date of Publication:

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