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PARAMETRIC EXPLORATION OF BRANCHING IN CPS TOWARDS THE APPLICATIONS OF MICRONEEDLES AND MICRO-VELCRO

by GOPALAKRISHNAN, APARNA

Abstract (Summary)
This work explores the parametric effects of stress and dimensional constraints under conditions of excess illumination in Coherent Porous Silicon The role of stress and spacing between the pores to cause branching under conditions of excess illumination is experimentally studied to help address the roadblocks faced in the fabrication of microneedles using CPS etching technology. The potential application of a micro-velcro or a microfastener is explored with an attempt to relate this study to understand the mechanisms responsible for the formation of the fish-hook structure during branching that aids this application. The objective of this work is to contribute to the experimental understanding and justification of the mechanisms responsible for causing the branching of pores during CPS etching in n-type silicon and gain valuable insights on possible methods to increase the spacing between individual pores in the array. This will enable fabrication of microneedles using CPS which have more sparse arrays to achieve greater penetration of the skin though the strength of the needles must be taken into account. The strength of the microneedle array is estimated analytically and using ANSYS to determine the variation of strength with length, cross-section and material properties of the needle . The analysis has been performed to determine if the microneedle array fabricated with Low Pressure Chemical Vapor Deposition LPCVD Silicon Nitride withstand greater force before fracture of the needles than the microneedle arrays fabricated with thermal oxide.
Bibliographical Information:

Advisor:

School:University of Cincinnati

School Location:USA - Ohio

Source Type:Master's Thesis

Keywords:mems cps branching micro velcro microneedles fracture

ISBN:

Date of Publication:01/01/2005

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