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THE FABRICATION OF A PHOTONIC CRYSTAL BASED THREE CHANNEL WAVELENGTH DIVISON DEMULTIPLEXER (WDDM) DEVICE

by Cao, Siwei

Abstract (Summary)
We introduce a model of a high efficiency photonic lattice based 3-channel wavelength division demultiplexer (WDDM). A 2-D photonic crystal structure is within Si3N4 layer is fabricated within air cladding on top and SiO2 beneath. The photonic crystal used for the WDDM device has a lattice constant of 213nm and air pores of 150nm in diameter. We also devise and present a full fabrication process to fabricate a three-channel WDDM device. Electron-beam lithography is successful and the results are reported. Some problems were encountered with Cr wet etch, and the results are reported. Also, a recipe for Si3N4 plasma etching is presented.
Bibliographical Information:

Advisor:

School:Miami University

School Location:USA - Ohio

Source Type:Master's Thesis

Keywords:wddm photonic crystal e beam lithography cr wet etch plasma

ISBN:

Date of Publication:01/01/2008

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