THE FABRICATION OF A PHOTONIC CRYSTAL BASED THREE CHANNEL WAVELENGTH DIVISON DEMULTIPLEXER (WDDM) DEVICE
We introduce a model of a high efficiency photonic lattice based 3-channel wavelength division demultiplexer (WDDM). A 2-D photonic crystal structure is within Si3N4 layer is fabricated within air cladding on top and SiO2 beneath. The photonic crystal used for the WDDM device has a lattice constant of 213nm and air pores of 150nm in diameter. We also devise and present a full fabrication process to fabricate a three-channel WDDM device. Electron-beam lithography is successful and the results are reported. Some problems were encountered with Cr wet etch, and the results are reported. Also, a recipe for Si3N4 plasma etching is presented.
School Location:USA - Ohio
Source Type:Master's Thesis
Keywords:wddm photonic crystal e beam lithography cr wet etch plasma
Date of Publication:01/01/2008