The Fabrication of Two Dimension Photonic Crystal and Positioning System
In this thesis, we use E-Beam lithography to finish the process of positioning system and 2D photonic crystal. We use the new E-Beam system to define some array patterns. By this test, we obtain the minimum linewidth is 55nm, and the maximum writable range is 250£gm*250£gm.
First, we fabricated the 2D photonic crystal microcavity and positioning system on the InGaAs/InAlAs which grown by molecular beam epitaxy (MBE) on InP substrate at 1564nm emission wavelength by E-beam lithography.
For the positioning system, we set up a origin point first. And then we design many rectangles whose length is 1£gm, width is 10£gm and gap is 1£gm along X axis and Y axis from the origin point. All of the patterns are regarded as the ruler. Finally, we design a big rectangle whose length is 250£gm and width is 10£gm to adjust the positioning angle above the ruler. The maximum error of the positioning system is 20nm.
For the 2D photonic crystal (2D PhC) microcavity, a triangular array of air columns is adopted. The lattice constant and air columns radius are 1150nm and 460nm, respectively. The TE modes photonic band gap of this structure are corresponding to wavelength range in 1535nm~1635nm. We remove signal defect and seven defects in the 2D PhC to form 2D PhC microcavities and the PhC microcavities have many defect modes. The Micro-PL measurement shows when the etching depth was deep enough, the PhC microcavities which have 1-defect and 7-defect appeared defect mode at 1622nm (a/£f=0.74) both. The intensity of 7-defect PhC is 7 times than 1-defect PhC. Both of them cooperate with our simulation and design. And the maximum Q value is about 324 at the defect mode.
Advisor:Min-Hsiung Shih; Tsung-Hsien Lin; Hao-Chung Kuo; Tsong-Sheng Lay; Chin-Ping Yu
School:National Sun Yat-Sen University
School Location:China - Taiwan
Source Type:Master's Thesis
Keywords:photonic crystal positioning system
Date of Publication:07/17/2008