Design and construction of plasma enhanced chemical vapor deposition reactor and directed assembly of carbon nanotubes [electronic resource] / by Joshua David Schumacher.
ABSTRACT: The goals of this research project were the design and construction of a carbon nanotube (CNT) reactor based on the plasma enhanced chemical vapor deposition (PECVD) principle and the development of a method for directed assembly of CNTs by catalyst patterning. PECVD was selected as the growth method due to the requirement of a catalyst for the growth process, thereby facilitating directed assembly and controlled diameter CNT growth at well-defined locations. The reactor was built in accord with horizontal flow design using standard ultra high vacuum components. The controllable parameters of the reactor include sample temperature, DC plasma intensity, chamber pressure, gas flow ratios, and total gas flow. The most favorable parameters for growing CNTs of well defined length, diameter, and separation were obtained by initially using parameter values obtained from literature, then optimized by changing a parameter and noting the effect on CNT growth.
School:University of South Florida
School Location:USA - Florida
Source Type:Master's Thesis
Keywords:precursor lithography patterning thermal process sputtering catalyst dissertations academic usf electrical engineering masters
Date of Publication:01/01/2003